Lectures and Workshop on “Plasma Science and Technology for Nanomaterial Engineering” was held on 3rd – 4th November 2016 in PUSDIKLAT UNS. At the 1st day, Activities has been going on at 07.30 until 15.30. Beginning with a welcoming speech by the UNS Science Faculty Dean, Prof. Ir. Ari Handono Ramelan, M.Sc. (Hons), Ph.D. as a representative of the university. Then proceed with the 1st plenary sessions delivered by Dr. Muh Nur, DEA from Diponegoro University with the topic: “Research & Development of Plasma Application in Indonesia” followed by Prof. Masaaki Nagatsu from Shizuoka University Japan with the topic: “Introduction to Plasma Science Technology and Its Global Progress”. The 1st plenary session was moderated by Dr. Eddy Heraldy, M.Si from Chemistry Dept., UNS. Furthermore, after the 1st plenary session is completed followed by discussions involving audience participation until 12:30 (break). Later, in the session break, the audience have to see and assess poster presentation by participants from within and outside UNS.


Events continued back at 13:00 with the 2nd plenary sessions delivered by Dr. Raman Bekarevich from the National Institute for Materials Science (NIMS) Japan with the topic: “Carbon Nanotube Engineering and Nanomanufacturing” followed by Teguh Endah Saraswati, Ph.D. from Chemistry Dept. UNS with the topic: “Fabrication and Modification of Carbon-based nanomaterials by Plasma Tech”, which was moderated by Dr. rer. nat. Witri Wahyu Lestari, M.Sc from Chemistry Dept. UNS. After the 2nd plenary session is completed then conducted discussions involving audience participation until 15:30.


At the 2nd day, activities continued by workshop sessions from KEYENCE Corp. ( キーエンス) with introduction of high resolution digital microscope and free trial for samples observation. Participants observed various kind of samples such as: living/non-living sample, biological sample, chemical and raw material, semiconductor/electronic circuit, automotive and metal, emulsion solar cell, ITO film, plate soldering, etc.

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